• DocumentCode
    988356
  • Title

    A Pearson Effective Potential for Monte Carlo Simulation of Quantum Confinement Effects in nMOSFETs

  • Author

    Jaud, Marie-Anne ; Barraud, Sylvain ; Saint-Martin, Jérôme ; Bournel, Arnaud ; Dollfus, Philippe ; Jaouen, Hervé

  • Author_Institution
    LETI, CEA, Grenoble
  • Volume
    55
  • Issue
    12
  • fYear
    2008
  • Firstpage
    3450
  • Lastpage
    3458
  • Abstract
    An original Pearson effective potential (PEP) model for including quantization effects in the simulation of nanoscale nMOSFETs has been introduced in a Monte Carlo (MC) simulator. The PEP correction properly accounts for quantum confinement effects in bulk-, single-, and double-gate silicon-on-insulator nMOS capacitors and nanoscale nMOSFETs devices. The results obtained from semiclassical, PEP-corrected, and multisubband MC approaches are reported and compared for a double-gate nMOSFET with a channel length L C=10 nm and a silicon film thickness T Si=5 nm at low and high drain voltages. Excellent agreements are obtained between PEP-corrected and multisubband MC methods on both electrical characteristics and microscopic quantities. Finally, the impact of quantum confinement effects on drive current is evaluated in double-gate structures over a large range of channel length and silicon film thickness.
  • Keywords
    MOSFET; Monte Carlo methods; nanoelectronics; semiconductor device models; silicon-on-insulator; Monte Carlo simulation; Pearson effective potential model; Si; bulk-gate silicon-on-insulator nMOS capacitors; double-gate silicon-on-insulator nMOS capacitors; electrical characteristics; microscopic quantities; nanoscale nMOSFET simulation; nanoscale nMOSFETs devices; quantization effects; quantum confinement effects; silicon film thickness; single-gate silicon-on-insulator nMOS capacitors; Capacitors; MOS devices; MOSFETs; Monte Carlo methods; Nanoscale devices; Potential well; Quantization; Semiconductor films; Silicon on insulator technology; Voltage; MOSFETs; Monte Carlo (MC) methods; Quantization; semiconductor device modeling;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2008.2006116
  • Filename
    4674567