DocumentCode
988356
Title
A Pearson Effective Potential for Monte Carlo Simulation of Quantum Confinement Effects in nMOSFETs
Author
Jaud, Marie-Anne ; Barraud, Sylvain ; Saint-Martin, Jérôme ; Bournel, Arnaud ; Dollfus, Philippe ; Jaouen, Hervé
Author_Institution
LETI, CEA, Grenoble
Volume
55
Issue
12
fYear
2008
Firstpage
3450
Lastpage
3458
Abstract
An original Pearson effective potential (PEP) model for including quantization effects in the simulation of nanoscale nMOSFETs has been introduced in a Monte Carlo (MC) simulator. The PEP correction properly accounts for quantum confinement effects in bulk-, single-, and double-gate silicon-on-insulator nMOS capacitors and nanoscale nMOSFETs devices. The results obtained from semiclassical, PEP-corrected, and multisubband MC approaches are reported and compared for a double-gate nMOSFET with a channel length L C=10 nm and a silicon film thickness T Si=5 nm at low and high drain voltages. Excellent agreements are obtained between PEP-corrected and multisubband MC methods on both electrical characteristics and microscopic quantities. Finally, the impact of quantum confinement effects on drive current is evaluated in double-gate structures over a large range of channel length and silicon film thickness.
Keywords
MOSFET; Monte Carlo methods; nanoelectronics; semiconductor device models; silicon-on-insulator; Monte Carlo simulation; Pearson effective potential model; Si; bulk-gate silicon-on-insulator nMOS capacitors; double-gate silicon-on-insulator nMOS capacitors; electrical characteristics; microscopic quantities; nanoscale nMOSFET simulation; nanoscale nMOSFETs devices; quantization effects; quantum confinement effects; silicon film thickness; single-gate silicon-on-insulator nMOS capacitors; Capacitors; MOS devices; MOSFETs; Monte Carlo methods; Nanoscale devices; Potential well; Quantization; Semiconductor films; Silicon on insulator technology; Voltage; MOSFETs; Monte Carlo (MC) methods; Quantization; semiconductor device modeling;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2008.2006116
Filename
4674567
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