DocumentCode :
988356
Title :
A Pearson Effective Potential for Monte Carlo Simulation of Quantum Confinement Effects in nMOSFETs
Author :
Jaud, Marie-Anne ; Barraud, Sylvain ; Saint-Martin, Jérôme ; Bournel, Arnaud ; Dollfus, Philippe ; Jaouen, Hervé
Author_Institution :
LETI, CEA, Grenoble
Volume :
55
Issue :
12
fYear :
2008
Firstpage :
3450
Lastpage :
3458
Abstract :
An original Pearson effective potential (PEP) model for including quantization effects in the simulation of nanoscale nMOSFETs has been introduced in a Monte Carlo (MC) simulator. The PEP correction properly accounts for quantum confinement effects in bulk-, single-, and double-gate silicon-on-insulator nMOS capacitors and nanoscale nMOSFETs devices. The results obtained from semiclassical, PEP-corrected, and multisubband MC approaches are reported and compared for a double-gate nMOSFET with a channel length L C=10 nm and a silicon film thickness T Si=5 nm at low and high drain voltages. Excellent agreements are obtained between PEP-corrected and multisubband MC methods on both electrical characteristics and microscopic quantities. Finally, the impact of quantum confinement effects on drive current is evaluated in double-gate structures over a large range of channel length and silicon film thickness.
Keywords :
MOSFET; Monte Carlo methods; nanoelectronics; semiconductor device models; silicon-on-insulator; Monte Carlo simulation; Pearson effective potential model; Si; bulk-gate silicon-on-insulator nMOS capacitors; double-gate silicon-on-insulator nMOS capacitors; electrical characteristics; microscopic quantities; nanoscale nMOSFET simulation; nanoscale nMOSFETs devices; quantization effects; quantum confinement effects; silicon film thickness; single-gate silicon-on-insulator nMOS capacitors; Capacitors; MOS devices; MOSFETs; Monte Carlo methods; Nanoscale devices; Potential well; Quantization; Semiconductor films; Silicon on insulator technology; Voltage; MOSFETs; Monte Carlo (MC) methods; Quantization; semiconductor device modeling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.2006116
Filename :
4674567
Link To Document :
بازگشت