Title :
GeMoW refractory ohmic contacts to n-type GaAs with In0.5Ga0.5As cap layer
Author :
Merkel, Kenneth G. ; Bright, V.M. ; Schauer, S.N. ; Huang, C.I. ; Robinson, G.D.
Author_Institution :
Wright Patterson AFB, OH, USA
fDate :
3/4/1993 12:00:00 AM
Abstract :
GeMoW is presented as a refractory ohmic contact to n-type GaAs with an In0.5Ga0.5As cap layer. The contact exhibits ohmic behaviour over a wide annealing temperature range from 300 to 700 degrees C. A minimum contact resistance of 0.176 Omega mm was obtained following furnace annealing at 500 degrees C.
Keywords :
III-V semiconductors; annealing; contact resistance; gallium arsenide; germanium alloys; indium compounds; molybdenum alloys; ohmic contacts; semiconductor-metal boundaries; tungsten alloys; 300 to 700 degC; 500 degC; GeMoW refractory ohmic contacts; GeMoW-In 0.5Ga 0.5As-GaAs; In 0.5Ga 0.5As cap layer; annealing temperature range; contact resistance; furnace annealing; n-type GaAs; semiconductors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19930321