• DocumentCode
    990715
  • Title

    Three-dimensional simulation of realistic single electron transistors

  • Author

    Fiori, Gianluca ; Pala, Marco G. ; Iannaccone, Giuseppe

  • Author_Institution
    Dipt. di Ingegneria dell´´Informazione, Univ. degli Studi di Pisa, Italy
  • Volume
    4
  • Issue
    4
  • fYear
    2005
  • fDate
    7/1/2005 12:00:00 AM
  • Firstpage
    415
  • Lastpage
    421
  • Abstract
    We present an approach, and its implementation in a computer program, for the three-dimensional (3-D) simulation of realistic single electron transistor (SET) structures, in which subregions with different degrees of quantum confinement are simultaneously considered. The proposed approach is based on the self-consistent solution of the many body Schrodinger equation with density functional theory and on the computation of the conductance of tunnel constrictions through the solution of the 3-D Schrodinger equation with open boundary conditions. We have developed an efficient code (ViDES) based on such an approach. As examples of addressable SET structures, we present the simulation of a SET, one defined by metal gates on an AlGaAs/GaAs heterostructures, and of a SET defined by etching and oxidation on the silicon-on-insulator material system. Since SETs represent prototypical nanoscale devices, the code may be a valuable tool for the investigation and optimization of a broad range of nanoelectronic solid-state devices.
  • Keywords
    III-V semiconductors; Poisson equation; Schrodinger equation; aluminium compounds; density functional theory; etching; gallium arsenide; nanoelectronics; oxidation; semiconductor device models; silicon-on-insulator; single electron transistors; tunnelling; 3-D Schrodinger equation; 3-D solver; 3D simulation; AlGaAs-GaAs; AlGaAs-GaAs heterostructures; Poisson equation; computer program; density functional theory; etching; many body Schrodinger equation; metal gates; nanoelectronic solid-state devices; nanoscale devices; oxidation; quantum confinement; realistic single electron transistor structures; self-consistent solution; silicon-on-insulator material system; silicon-on-insulator technology; split gates; tunnel conductance; Boundary conditions; Computational modeling; Computer simulation; Density functional theory; Gallium arsenide; Nanoscale devices; Potential well; Quantum computing; Schrodinger equation; Single electron transistors; Poisson/SchrÖdinger; silicon-on-insulator (SOI) technology; single electron transistors (SETs); split gates; three-dimensional (3-D) solver;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2005.851284
  • Filename
    1461389