Title :
Performance modeling of resonant tunneling-based random-access memories
Author :
Zhang, Hui ; Mazumder, Pinaki ; Ding, Li ; Yang, Kyounghoon
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Michigan, Ann Arbor, MI, USA
fDate :
7/1/2005 12:00:00 AM
Abstract :
Resonant tunneling-based random-access memories (TRAMs) have recently garnered a great amount of interest among memory designers due to their intrinsic merits such as reduced power consumption by elimination of refreshing operation, faster read and write cycles, and improved reliability in comparison to conventional silicon dynamic random access memories (DRAMs). In order to understand the precise principle of operation of TRAM memories, an in-depth circuit analysis has been attempted in this paper and analytical models for memory cycle time, soft error rate, and power consumption have been derived. The analytical results are then validated by simulation experiments performed with HSPICE. These results are then compared with conventional DRAMs to establish the claim of superiority of TRAM performance to DRAM performance.
Keywords :
DRAM chips; power consumption; resonant tunnelling devices; write-once storage; HSPICE; critical charge; in-depth circuit analysis; memory cycle time; memory designers; read cycles; reduced power consumption; refreshing operation; resonant tunneling-based random-access memories; silicon dynamic random access memories; soft error rate; write cycles; Analytical models; Circuit analysis; Circuit simulation; DRAM chips; Energy consumption; Error analysis; Performance analysis; Read-write memory; Resonant tunneling devices; Silicon; Critical charge; dynamic random access memory (DRAM); power consumption; soft error rate (SER); tunneling-based random-access memory (TRAM);
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2005.851288