DocumentCode :
991209
Title :
Depletion-All-Around Operation of the SOI Four-Gate Transistor
Author :
Akarvardar, Kerem ; Cristoloveanu, Sorin ; Gentil, Pierre ; Schrimpf, Ronald D. ; Blalock, Benjamin J.
Author_Institution :
Inst. of Microelectron., Electromagnetism, & Photonics, Grenoble
Volume :
54
Issue :
2
fYear :
2007
Firstpage :
323
Lastpage :
331
Abstract :
In the silicon-on-insulator four-gate transistors (G4-FETs), the conducting channel can be surrounded by depletion regions induced by independent vertical metal-oxide-semiconductor gates and lateral JFET gates. This unique conduction mechanism named depletion-all-around (DAA) enables majority carriers to flow in the volume of the silicon film far from the silicon/oxide interfaces. Especially when the interfaces are driven to inversion, the control of the lateral JFET gates on the conduction is maximized, while the sensitivity of the volume channel to the oxide and interface defects is minimized. This leads to excellent analog performance, low noise, and reduced sensitivity to ionizing radiation. The G4-FET properties in DAA mode are presented from multiple perspectives: experimental results, 3-D device simulations, and analytical modeling
Keywords :
MOSFET; junction gate field effect transistors; radiation hardening (electronics); semiconductor device models; silicon-on-insulator; G4-FET; SOI four-gate transistor; conducting channel; depletion regions; depletion-all-around operation; ionizing radiation; lateral JFET gates; low-frequency noise; multiple-gate transistor; silicon-on-insulator four-gate transistors; sub-threshold swing; total-dose radiation-hardness; vertical metal-oxide-semiconductor gates; Analog circuits; Analytical models; CMOS technology; Low-frequency noise; MOSFET circuits; Microelectronics; Photonics; Silicon on insulator technology; Transconductance; Voltage; Analog; Early voltage; JFET; low-frequency noise; multiple-gate transistor; silicon-on-insulator (SOI); subthreshold swing; total-dose radiation-hardness; transconductance; transconductance-to-current ratio;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.888749
Filename :
4067170
Link To Document :
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