DocumentCode
991424
Title
Recovery and Drift Dynamics of Resistance and Threshold Voltages in Phase-Change Memories
Author
Ielmini, Daniele ; Lacaita, Andrea L. ; Mantegazza, Davide
Author_Institution
Dipt. di Elettronica e Informazione, Politecnico di Milano
Volume
54
Issue
2
fYear
2007
Firstpage
308
Lastpage
315
Abstract
The electronic behavior of the chalcogenide material used in phase-change memory (PCM) plays a key role in defining the operation voltages and times of the memory cell. In particular, the threshold voltage for electronic switching of the amorphous chalcogenide determines the boundary between programming and readout operation, while its resistance allows the recognition of the bit status. This paper present a time-resolved analysis of threshold voltage and resistance in a PCM. Both dynamics of threshold voltage and resistance display a fast transient, named recovery behavior, in the first 30 ns after programming. A slower, nonsaturating drift transient is found for longer times. The two transients are discussed referring to electronic and structural rearrangements in the amorphous chalcogenide. Finally, the impact on the device level is considered
Keywords
chalcogenide glasses; phase change materials; random-access storage; amorphous chalcogenide; chalcogenide materials; drift dynamics; electronic switching; nonsaturating drift transient; nonvolatile memories; phase-change memories; recovery behavior; threshold switching; threshold voltages; time-resolved analysis; Amorphous materials; Crystalline materials; Crystallization; Dynamic programming; Nonvolatile memory; Phase change materials; Phase change memory; Pulse measurements; Senior members; Threshold voltage; Chalcogenide materials; nonvolatile memories; phase-change memories (PCMs); threshold switching;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2006.888752
Filename
4067188
Link To Document