Title :
Increased carrier lifetimes in epitaxial silicon layers on buried silicon nitride produced by ion implantation
Author :
Skorupa, W ; Kreissig, U. ; Hensel, E. ; Bartsch, H.
Author_Institution :
Academy of Sciences of the GDR, Central Institute for Nuclear Research, Dresden, East Germany
Abstract :
Carrier lifetimes were measured in epitaxial silicon layers deposited on buried silicon nitride produced by high-dose nitrogen implantation at 330 keV. The values were in the range 20¿200 ¿s. The results are remarkable taking into account the high density of crystal defects in the epitaxial layers. Comparing with other SOI technologies the measured lifetimes are higher by 1¿2 orders of magnitude.
Keywords :
carrier lifetime; ion implantation; semiconductor epitaxial layers; silicon; SOI technologies; Si epitaxial layers; buried Si3N4; carrier lifetimes; crystal defects; ion implantation; semiconductors;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19840295
