• DocumentCode
    993188
  • Title

    Microprocessing of GaAs cylindrical columns for integrated optical device fabrication by Cl2-Ar reactive ion etching

  • Author

    Yamada, Hiroyoshi ; Ito, H. ; Inaba, Hiromi

  • Author_Institution
    Tohoku University, Research Institute of Electrical Communication, Sendai, Japan
  • Volume
    20
  • Issue
    14
  • fYear
    1984
  • Firstpage
    591
  • Lastpage
    592
  • Abstract
    We report a reactive ion etching (RIE) technique employing a Cl2-Ar gas mixture for GaAs integrated optical device fabrication. This RIE enables one to process GaAs and AlGaAs wafers independently of crystal orientation. Etching characteristics and a demonstration of the vertical etching of GaAs wafers in the shape of a cylindrical column are described.
  • Keywords
    III-V semiconductors; gallium arsenide; integrated circuit technology; integrated optics; optical workshop techniques; optoelectronic devices; sputter etching; AlGaAs wafers; Cl2-Ar reactive ion etching; GaAs cylindrical columns; IC technology; III-V semiconductor; RIE; integrated optical device fabrication; optical workshop techniques; optoelectronic devices; vertical etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19840408
  • Filename
    4248885
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=993188