DocumentCode :
993753
Title :
Low-frequency noise in advanced CMOS/SOI devices
Author :
Jomaah, J. ; Balestra, F.
Author_Institution :
CNRS-INPG-UJF, Grenoble, France
Volume :
151
Issue :
2
fYear :
2004
fDate :
4/12/2004 12:00:00 AM
Firstpage :
111
Lastpage :
117
Abstract :
The low-frequency noise (LFN) in partially- and fully-depleted SOI CMOS technologies is overviewed. The static performances and the drain current noise in both linear and saturation regimes are presented for different SOI architectures. Particular attention is paid to the floating body effect that induces a kink-related excess noise, which superimposes a Lorentzian spectrum on the flicker noise. The behaviour of this effect with the frequency and the physical mechanisms explaining this excess noise, are discussed. The control of this noise overshoot by using a body contact or by applying a back gate voltage is also demonstrated. Also, LFN in DTMOS (dynamic threshold MOS) with the body connected to the gate is studied. The use of a clamping transistor as a body current limiter results in excess Lorentzian-like noise, which is similar to the noise induced by the kink effect. Finally, the influence of the gate leakage in an SOI MOS with thin oxide is shown.
Keywords :
MOSFET; flicker noise; semiconductor device noise; silicon-on-insulator; Lorentzian spectrum; SOI architectures; advanced CMOS/SOI devices; back gate voltage; body contact; body current limiter; clamping transistor; drain current noise; dynamic threshold MOS; excess Lorentzian-like noise; flicker noise; floating body effect; fully-depleted SOI CMOS technology; gate leakage; kink effect; kink-related excess noise; linear regimes; low-frequency noise; noise overshoot; partially-depleted SOI CMOS technology; saturation regimes; static performances;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:20040109
Filename :
1300994
Link To Document :
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