• DocumentCode
    993981
  • Title

    Simulation of Gas-Phase Kinetics in CHF3:H2: O2 Mixtures

  • Author

    Voloshin, Dmitry G. ; Klopovskiy, Konstantin S. ; Mankelevich, Yuri A. ; Popov, Nikolay A. ; Rakhimova, Tatyana V. ; Rakhimov, Alexander T.

  • Author_Institution
    Moscow State Univ., Moscow
  • Volume
    35
  • Issue
    6
  • fYear
    2007
  • Firstpage
    1691
  • Lastpage
    1703
  • Abstract
    A gas-phase reaction model for and mixtures was developed. Self-consistent electron impact cross-section set for was introduced. The original total and partial dissociation cross sections were received. A developed gas-phase kinetic scheme was tested on the experimental data. An important role of the chain reactions in the kinetics of F and H atoms and radicals was revealed.
  • Keywords
    electron impact dissociation; gas mixtures; hydrogen; organic compounds; oxygen; plasma chemistry; plasma simulation; chain reactions; gas-phase kinetics; partial dissociation cross sections; plasma-chemical simulation; self-consistent electron impact cross-section set; trifluoromethane-H2-O2 mixtures; Electrons; Etching; Hafnium; Hydrogen; Kinetic theory; Plasma applications; Plasma measurements; Plasma simulation; Polymer films; Testing; $hbox{CHF}_{3}$ electron impact cross-section set; $hbox{CHF}_{3}$-contained plasma; plasma-chemical simulation;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2007.906780
  • Filename
    4392558
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=993981