DocumentCode :
994016
Title :
Diffused planar InP bipolar transistor with a cadmium oxide film emitter
Author :
Su, L.M. ; Grote, N. ; Schmitt, F.
Author_Institution :
Heinrich-Hertz-Institut fÿr Nachrichtentechnik Berlin GmbH, Berlin, West Germany
Volume :
20
Issue :
18
fYear :
1984
Firstpage :
716
Lastpage :
717
Abstract :
A novel bipolar InP transistor is demonstrated which comprises a Zn-diffused base and a transparent conductor widegap emitter made of sputtered cadmium oxide. Preliminary current gain was about 10. Owing to its less demanding planar technology the device is assessed to be promising for monolithic integration.
Keywords :
III-V semiconductors; bipolar transistors; indium compounds; CdO sputtered layer; III-V semiconductor; InP bipolar transistor; Zn-diffused base; monolithic integration; planar technology; transparent conductor widegap emitter;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19840490
Filename :
4248992
Link To Document :
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