DocumentCode :
994610
Title :
Properties of NbN films crystallized from the amorphous state
Author :
Gavaler, J.R. ; Greggi, J. ; Wilmer, R. ; Ekin, J.W.
Author_Institution :
Westinghouse R&D Center, Pittsburgh, PA
Volume :
19
Issue :
3
fYear :
1983
fDate :
5/1/1983 12:00:00 AM
Firstpage :
418
Lastpage :
421
Abstract :
Cubic Bl structure NbN was prepared by annealing amorphous Nb-N films made by sputtering niobium in an argon-nitrogen atmosphere onto low temperature ( \\tilde{<} 350^{\\circ} C) substrates. Crystallized films on sapphire substrates have equiaxed grains while films on niobium are columnar. Grain sizes vary from 12.5 nm to > 100 nm. The highest superconducting critical properties measured in these films are: Tc= 16K, Jc(4.2K, zero field) = 8 × 105A/cm2, and Bc2(1.3K) = 28T. Data on the effect of uniaxial tensile strain on Jcshow that there is no measurable elastic (reversible) strain effect. Irreversible Jcdegradation begins at an intrinsic tensile strain of 1.3% in the best case.
Keywords :
Amorphous semiconductor materials/devices; Conducting films; Sputtering; Superconducting materials; Amorphous materials; Annealing; Atmosphere; Crystallization; Grain size; Niobium; Sputtering; Strain measurement; Superconducting films; Tensile strain;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1983.1062421
Filename :
1062421
Link To Document :
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