DocumentCode :
994823
Title :
Process characterization of Niobium based Josephson integrated circuits
Author :
Villegier, J. ; Goniche, M. ; Levis, M. ; Renard, P. ; Vabre, M. ; Veler, J.C.
Author_Institution :
L.E.T.I., Commissariat A L´´Energie Atomique, Grenoble France
Volume :
19
Issue :
3
fYear :
1983
fDate :
5/1/1983 12:00:00 AM
Firstpage :
942
Lastpage :
945
Abstract :
Process test chips for Josephson integrated Circuits including refractory metal resistors have been achieved and tested with Niobium based technology made in LETI. Tantalum resistors are lying above niobium base electrode. Such a configuration gives compact logic circuits and very good mechanical bahaviours. An entire 14 layers technology including Nb-Nb2O5- Pb(In) tunnel junctions, control lines and contact pads is being achieved and described. Arrays of 100 interferometers cells, superconductive contacts in series, and other chips for measuring capacitance of junctions and insulators, penetration depths in superconductive materials, resistors are fabricated on sapphire, wafers and tested. Such devices yield a good stability upon thermal cycling and storage at room temperature.
Keywords :
Integrated circuit fabrication; Josephson device logic circuits; Capacitance measurement; Circuit testing; Electrodes; Integrated circuit technology; Integrated circuit testing; Interferometers; Logic circuits; Niobium; Resistors; Superconductivity;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1983.1062441
Filename :
1062441
Link To Document :
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