DocumentCode
995347
Title
Two-dimensional profiles of impurity diffusion in semiconductors
Author
Buonomo, A. ; Di Bello, C.
Author_Institution
UniversitÃ\xa0 della Calabria, Dipartimento Elettrico, Cosenza, Italy
Volume
20
Issue
22
fYear
1984
Firstpage
909
Lastpage
910
Abstract
The letter shows how two-dimensional impurity profiles in semiconductors can be calculated by applying a simple and efficient finite difference algorithm. The diffusion coefficient employed in the model depends on the impurity concentrations in accordance with the recent theory of nonlinear diffusion in semiconductors. The limit of validity of the more simple linear diffusion model is also determined.
Keywords
difference equations; diffusion in solids; doping profiles; semiconductors; diffusion coefficient; finite difference algorithm; impurity diffusion; linear diffusion model; nonlinear diffusion; semiconductors; two-dimensional impurity profiles;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19840618
Filename
4249130
Link To Document