• DocumentCode
    995347
  • Title

    Two-dimensional profiles of impurity diffusion in semiconductors

  • Author

    Buonomo, A. ; Di Bello, C.

  • Author_Institution
    UniversitÃ\xa0 della Calabria, Dipartimento Elettrico, Cosenza, Italy
  • Volume
    20
  • Issue
    22
  • fYear
    1984
  • Firstpage
    909
  • Lastpage
    910
  • Abstract
    The letter shows how two-dimensional impurity profiles in semiconductors can be calculated by applying a simple and efficient finite difference algorithm. The diffusion coefficient employed in the model depends on the impurity concentrations in accordance with the recent theory of nonlinear diffusion in semiconductors. The limit of validity of the more simple linear diffusion model is also determined.
  • Keywords
    difference equations; diffusion in solids; doping profiles; semiconductors; diffusion coefficient; finite difference algorithm; impurity diffusion; linear diffusion model; nonlinear diffusion; semiconductors; two-dimensional impurity profiles;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19840618
  • Filename
    4249130