DocumentCode :
995420
Title :
InGaAs/InP mesa photodetector passivated with silicon dioxide
Author :
Antell, G.R. ; Murison, R.F.
Author_Institution :
Standard Telecommunication Laboratories Ltd., Harlow, UK
Volume :
20
Issue :
22
fYear :
1984
Firstpage :
919
Lastpage :
920
Abstract :
A combination of mesa and planar techniques has enabled detectors of InGaAs on InP substrates to be masked during diffusion and later passivated by SiO2 films without degrading the dark current. Preliminary lifetests at 100°C are encouraging.
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; passivation; photodetectors; III-V semiconductor; InGaAs; InGaAs/InP mesa photodetector; InP substrates; SiO2 passivation; dark current; diffusion; mask; planar techniques;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19840625
Filename :
4249137
Link To Document :
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