Frequency effects in capacitively coupled radio-frequency glow discharges: a comparison between a 2-D fluid model and experiments

Author

Goedheer, W.J. ; Meijer, P.M. ; Bezemer, J. ; van Sark, Wilfried G. J. H. M.

Author_Institution

FOM Inst. for Plasma Phys., Nieuwegein

Volume

23

Issue

4

fYear

1995

fDate

8/1/1995 12:00:00 AM

Firstpage

644

Lastpage

649

Abstract

The results of a 2-D fluid model for argon radiofrequency (RF) discharges in a closed cylindrical vacuum chamber are compared with experimental data from an amorphous silicon deposition reactor operated in argon. Good agreement is obtained for the relation between the DC autobias voltage and the dissipated power in the frequency range 40-100 MHz at pressures between 10 and 60 Pa. Scaling laws are presented for the dissipated power and for the ion fluxes toward the electrodes. These quantities are expressed in the DC bias voltage, the RF excitation frequency and the background pressure. Also the uniformity of the ion fluxes is studied. The model yields a linear relation between the applied RF voltage and the DC bias voltage. This relation depends only on the geometry of the discharge chamber and shows an offset

Keywords

argon; glow discharges; high-frequency discharges; plasma; plasma transport processes; 10 to 60 Pa; 2D fluid model; 40 to 100 MHz; Ar; Ar discharge; DC autobias voltage; DC bias voltage; RF excitation frequency; amorphous Si deposition reactor; applied RF voltage; background pressure; capacitively coupled radio-frequency glow discharges; closed cylindrical vacuum chamber; discharge chamber; dissipated power; frequency effects; ion fluxes; linear relation; scaling laws; Argon; Electrodes; Geometry; Glow discharges; Inductors; Plasma applications; Radio frequency; Solid modeling; Surface discharges; Voltage;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.467986

Filename

467986