DocumentCode :
995742
Title :
Comparison of electrical discharge techniques for nonthermal plasma processing of NO in N2
Author :
Penetrante, Bernie M. ; Hsiao, Mark C. ; Merritt, Bernard T. ; Vogtlin, George E. ; Wallman, Henrik P.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
Volume :
23
Issue :
4
fYear :
1995
fDate :
8/1/1995 12:00:00 AM
Firstpage :
679
Lastpage :
687
Abstract :
This paper presents a comparative assessment of three types of electrical discharge reactors: 1) pulsed corona, 2) dielectric-barrier discharge, and 3) dielectric-pellet bed reactor. The emphasis is on the efficiency for electron-impact dissociation of N2(e+N2 →e+N+N) and the subsequent chemical reduction of NO by nitrogen atoms (N+NO→N2+O). By measuring the concentration of NO as a function of input energy density in dilute mixtures of NO in N2, it is possible to determine the specific energy cost for the dissociation of N2. Our experimental results show that the specific energy consumption (eV per NO molecule reduced) of different types of electrical discharge reactors are all similar. These results imply that, during radical production in electrical discharge reactors, the electric field experienced by the plasma is space-charge shielded to approximately the same value. The specific energy consumption for the dissociation of N2 using electrical discharge processing is measured to be around 240 eV per nitrogen atom produced. In the NO-N2 mixture, this corresponds to a specific energy consumption of around 240 eV per NO molecule reduced
Keywords :
chemical reactions; corona; discharges (electric); electron impact dissociation; molecule-electron collisions; nitrogen compounds; plasma applications; plasma collision processes; reduction (chemical); 240 eV; N2; NO; NO-N2; chemical reduction; dielectric-barrier discharge; dielectric-pellet bed reactor; electrical discharge reactors; electrical discharge techniques; electron-impact dissociation; input energy density; nonthermal plasma processing; pulsed corona; radical production; space-charge shielding; specific energy consumption; specific energy cost; Atomic measurements; Chemicals; Corona; Density measurement; Dielectrics; Energy consumption; Energy measurement; Inductors; Nitrogen; Plasma measurements;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.467990
Filename :
467990
Link To Document :
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