• DocumentCode
    995786
  • Title

    Tonks-Langmuir problem for a bi-Maxwellian plasma

  • Author

    Godyak, Valery A. ; Meytlis, Vladimir P. ; Strauss, Henry R.

  • Author_Institution
    OSRAM Sylvania Inc., Danvers, MA, USA
  • Volume
    23
  • Issue
    4
  • fYear
    1995
  • fDate
    8/1/1995 12:00:00 AM
  • Firstpage
    728
  • Lastpage
    734
  • Abstract
    An analytical solution of the Tonks-Langmuir (TL) problem with a bi-Maxwellian electron energy distribution function (EEDF) is obtained for a plasma slab. The solution shows that the ambipolar potential, the plasma density distribution, and the ion flux to the wall are mainly governed by the cold electrons, while the ionization rate and voltage drop across the wall sheath are governed by the hot electrons. The ionization rate by direct electron impact is found to be spatially rather uniform, contrary to the T-L solution where it is proportional to the plasma density distribution. The temperature of hot electrons defined by the ionization balance is found to be close to that of the T-L solution for a mono-Maxwellian EEDF, and is in reasonable agreement with experiments carried out in a low pressure capacitance RF discharge. The energy balance for cold electrons in this discharge shows that their heating by hot electrons via Coulomb interaction is equalized by the cold electrons´ escape to the RF electrodes during collapse of the RF sheath
  • Keywords
    discharges (electric); high-frequency discharges; plasma density; plasma sheaths; plasma temperature; plasma theory; RF sheath; Tonks-Langmuir problem; ambipolar potential; analytical solution; bi-Maxwellian plasma; electron energy distribution function; electron impact; energy balance; hot electron temperature; hot electrons; ion flux; ionization balance; ionization rate; low pressure capacitance RF discharge; plasma density distribution; plasma slab; voltage drop; wall sheath; Capacitance; Distribution functions; Electrons; Ionization; Plasma density; Plasma sheaths; Plasma temperature; Radio frequency; Slabs; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.467995
  • Filename
    467995