DocumentCode
9959
Title
Electron Barrier Engineering in a Thin-Film Intermediate-Band Solar Cell
Author
Ahsan, Nazmul ; Miyashita, Naoya ; Kin Man Yu ; Walukiewicz, Wladek ; Okada, Yoshitaka
Author_Institution
Res. Center for Adv. Sci. & Technol., Univ. of Tokyo, Tokyo, Japan
Volume
5
Issue
3
fYear
2015
fDate
May-15
Firstpage
878
Lastpage
884
Abstract
Improved open-circuit voltages have been achieved in dilute nitride thin-film intermediate-band solar cells by optimizing intermediate-band barrier layers. The blocking properties of the AlGaAs electron barrier are found to critically depend on the barrier-doping level. Open-circuit voltages VOC improved when electron-doping levels in the AlGaAs barriers were reduced. This is ascribed to the increased association of VOC with the larger gap defined by the valence and conduction bands due to the improved electrical isolation of the intermediate band.
Keywords
III-V semiconductors; aluminium compounds; conduction bands; gallium arsenide; semiconductor doping; semiconductor thin films; solar cells; thin film devices; valence bands; AlGaAs; AlGaAs electron barrier; barrier-doping level; conduction bands; dilute nitride thin-film intermediate-band solar cells; electrical isolation; electron barrier; electron-doping levels; intermediate band; intermediate-band barrier layers; open-circuit voltages; valence bands; Absorption; Doping; Electric potential; Gallium arsenide; Photonic band gap; Photovoltaic cells; Sun; Dilute nitride; intermediate-band (IB) solar cell; molecular beam epitaxy (MBE); thin-film solar cell;
fLanguage
English
Journal_Title
Photovoltaics, IEEE Journal of
Publisher
ieee
ISSN
2156-3381
Type
jour
DOI
10.1109/JPHOTOV.2015.2412451
Filename
7076589
Link To Document