• DocumentCode
    9959
  • Title

    Electron Barrier Engineering in a Thin-Film Intermediate-Band Solar Cell

  • Author

    Ahsan, Nazmul ; Miyashita, Naoya ; Kin Man Yu ; Walukiewicz, Wladek ; Okada, Yoshitaka

  • Author_Institution
    Res. Center for Adv. Sci. & Technol., Univ. of Tokyo, Tokyo, Japan
  • Volume
    5
  • Issue
    3
  • fYear
    2015
  • fDate
    May-15
  • Firstpage
    878
  • Lastpage
    884
  • Abstract
    Improved open-circuit voltages have been achieved in dilute nitride thin-film intermediate-band solar cells by optimizing intermediate-band barrier layers. The blocking properties of the AlGaAs electron barrier are found to critically depend on the barrier-doping level. Open-circuit voltages VOC improved when electron-doping levels in the AlGaAs barriers were reduced. This is ascribed to the increased association of VOC with the larger gap defined by the valence and conduction bands due to the improved electrical isolation of the intermediate band.
  • Keywords
    III-V semiconductors; aluminium compounds; conduction bands; gallium arsenide; semiconductor doping; semiconductor thin films; solar cells; thin film devices; valence bands; AlGaAs; AlGaAs electron barrier; barrier-doping level; conduction bands; dilute nitride thin-film intermediate-band solar cells; electrical isolation; electron barrier; electron-doping levels; intermediate band; intermediate-band barrier layers; open-circuit voltages; valence bands; Absorption; Doping; Electric potential; Gallium arsenide; Photonic band gap; Photovoltaic cells; Sun; Dilute nitride; intermediate-band (IB) solar cell; molecular beam epitaxy (MBE); thin-film solar cell;
  • fLanguage
    English
  • Journal_Title
    Photovoltaics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    2156-3381
  • Type

    jour

  • DOI
    10.1109/JPHOTOV.2015.2412451
  • Filename
    7076589