High rate deposition of iron-oxide thin films by reactive sputtering

For the preparation of γ-Fe2O3thin films, an improved process utilizing a sputtering technique is described. Iron-oxide thin films were prepared by reactive sputtering of an Fe target in Ar+O2atmosphere. Sputtered α-Fe2O3thin films were deposited at about ten times higher rate than the conventional method. Next, α-Fe2O3films were reduced in an hydrogen atmosphere. Typical reduced films showed a high squareness of 0.84 and a coercive force of 350 Oe.