DocumentCode :
996854
Title :
Evaluation of the Proton Induced Bulk Damage in SDRAM Utilizing 90 nm Process Technology
Author :
Shindou, H. ; Kuboyama, S. ; Ikeda, N. ; Satoh, Y. ; Hirao, T. ; Tamura, T.
Author_Institution :
Japan Aerosp. Exploration Agency, Tsukuba
Volume :
54
Issue :
6
fYear :
2007
Firstpage :
2233
Lastpage :
2237
Abstract :
We describe proton induced bulk damage observed in 90 nm process SDRAM. The degradation of the data retention ability was evaluated. The effect due to the difference of process technology and memory cell structure was discussed. The result indicates that the value of the capacitance of the storage capacitor and the volume of the depletion region are key parameters concerning the failures caused by bulk damage.
Keywords :
DRAM chips; SRAM chips; proton effects; SDRAM; capacitance; data retention; memory cell structure; proton induced bulk damage; size 90 nm; storage capacitor; Capacitance; Capacitors; Degradation; Electric variables; Helium; Iron; Protons; SDRAM; Semiconductor devices; Single event upset; 90 nm; Bulk damage; SDRAM; protons; retention time;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2007.910876
Filename :
4395080
Link To Document :
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