• DocumentCode
    998093
  • Title

    Magnetic and structural characteristics of ion beam sputter deposited Co-Cr thin films

  • Author

    Gill, H.S. ; Rosenblum, M.P. ; Gill, Harjot ; Rosenblum, Mendel

  • Author_Institution
    Hewlett-Packard Laboratories, Palo Alto, California
  • Volume
    19
  • Issue
    5
  • fYear
    1983
  • fDate
    9/1/1983 12:00:00 AM
  • Firstpage
    1644
  • Lastpage
    1646
  • Abstract
    -The magnetic and structural characteristics of ion beam sputter deposited Co82Cr18films were investigated. Films of between 1000A and 10,000A thickness were deposited on glass, titanium, chromium and amorphous Ta-W-Ni. The average angle of incidence of the sputtered species was normal to the substrate surface. Film orientation was determined by x-ray pole figure analysis. In films deposited on glass with thicknesses below 10,000A, the
  • Keywords
    Magnetic recording/recording materials; Sputtering; Amorphous magnetic materials; Chromium; Etching; Ion beams; Magnetic films; Optical films; Perpendicular magnetic recording; Sputtering; Substrates; Titanium;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1983.1062737
  • Filename
    1062737
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=998093