Title :
Magnetic and structural characteristics of ion beam sputter deposited Co-Cr thin films
Author :
Gill, H.S. ; Rosenblum, M.P. ; Gill, Harjot ; Rosenblum, Mendel
Author_Institution :
Hewlett-Packard Laboratories, Palo Alto, California
fDate :
9/1/1983 12:00:00 AM
Abstract :
-The magnetic and structural characteristics of ion beam sputter deposited Co82Cr18films were investigated. Films of between 1000A and 10,000A thickness were deposited on glass, titanium, chromium and amorphous Ta-W-Ni. The average angle of incidence of the sputtered species was normal to the substrate surface. Film orientation was determined by x-ray pole figure analysis. In films deposited on glass with thicknesses below 10,000A, the
Keywords :
Magnetic recording/recording materials; Sputtering; Amorphous magnetic materials; Chromium; Etching; Ion beams; Magnetic films; Optical films; Perpendicular magnetic recording; Sputtering; Substrates; Titanium;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1983.1062737
