DocumentCode :
999736
Title :
Offset word-line architecture for scaling DRAMs to the gigabit level
Author :
Scheuerlein, Roy E. ; Meindl, James D.
Author_Institution :
Center for Integrated Syst., Stanford Univ., CA, USA
Volume :
23
Issue :
1
fYear :
1988
Firstpage :
41
Lastpage :
47
Abstract :
An alternative to the boosted word-line DRAM architecture is described that is scalable to the gigabit level and avoids the problems of poor performance and high gate fields of conventional boosted word-line circuits. The alternative is called an offset word-line architecture, because the cell switch is changed to depletion mode and the word line is pulled beyond the cell switch device´s source voltage rather than boosted beyond its drain voltage. The large voltage swing for the word line does not cause large fields across the gate dielectric in the word-line driver or array access device because the gates of some devices use materials with modified work functions. The word-line voltage swing can be greater than the bit-line voltage swing plus the required threshold voltage even for gigabit-scale integration DRAM technologies.<>
Keywords :
CMOS integrated circuits; VLSI; integrated memory circuits; random-access storage; CMOS IC; DRAM; VLSI; depletion mode; dynamic RAM; gigabit-scale integration; memory circuits; offset word-line architecture; source voltage; word-line voltage swing; Boosting; Capacitors; Circuits; Delay; Dielectric devices; Dielectric materials; Random access memory; Signal restoration; Switches; Threshold voltage;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/4.254
Filename :
254
Link To Document :
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