DocumentCode :
999748
Title :
A new analytical model for the GaAs MESFET in the saturation region
Author :
Pouvil, Pierre ; Gautier, Jean-Luc ; Pasquet, Daniel
Author_Institution :
ENSEA, Cergy, France
Volume :
35
Issue :
8
fYear :
1988
fDate :
8/1/1988 12:00:00 AM
Firstpage :
1215
Lastpage :
1222
Abstract :
A model that provides the static characteristics and the elements of the equivalent electrical scheme is presented. It is based on an approximate quadratic form for the depleted region under the gate when the electron velocity reaches the saturation velocity. The potential in the channel is calculated using Poisson´s equation and taking into account the variation of the electron density inside it. The main physical phenomena such as edge effects, overshoot velocity, and carrier injection in the buffer layer are also taken into account. Theoretical and experimental results for the I-V characteristics, transconductance, output conductance, gate-source capacitance, and gate-drain capacitance are presented for a submicrometer-gate MESFET. The results calculated using this model agree well with experimental data
Keywords :
III-V semiconductors; Schottky gate field effect transistors; capacitance; gallium arsenide; semiconductor device models; GaAs; I-V characteristics; Poisson´s equation; analytical model; buffer layer; carrier injection; depleted region; edge effects; equivalent electrical scheme; experimental results; gate-drain capacitance; gate-source capacitance; models; output conductance; overshoot velocity; physical phenomena; saturation region; static characteristics; submicrometer-gate MESFET; submicron MESFETs semiconductors; transconductance; Analytical models; Buffer layers; Capacitance; Electron mobility; FETs; Gallium arsenide; MESFETs; Neodymium; Poisson equations; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.2540
Filename :
2540
Link To Document :
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