DocumentCode :
999784
Title :
Rethinking X-ray lithography
Author :
Zorpette, Glenn
Volume :
29
Issue :
6
fYear :
1992
fDate :
6/1/1992 12:00:00 AM
Firstpage :
33
Lastpage :
36
Abstract :
A viable alternative to synchrotron-based fabrication lines is discussed. These are collimated point X-ray sources that will cost a fraction of the price of synchrotrons. The two basic configurations for X-ray lithography-proximity and projection-are explained. Two basic methods for collimating the sources are described, and the advantages and disadvantages of each are examined.<>
Keywords :
X-ray lithography; X-ray lithography; collimated point X-ray sources; collimation methods; projection lithography; proximity lithography; Circuits; Costs; Electromagnetic radiation; Fabrication; Laboratories; Optical collimators; Optical devices; Resists; Synchrotrons; X-ray lithography;
fLanguage :
English
Journal_Title :
Spectrum, IEEE
Publisher :
ieee
ISSN :
0018-9235
Type :
jour
DOI :
10.1109/6.254017
Filename :
254017
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=999784
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